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EMICON MC
The EMICON MC systems are qualified for most applications in
plasma technology for analyzing the plasma, for optimizing the
process, for plasma monitoring, for quality control and for process
controlling. The turn-key EMICON MC systems come with all
features necessary for monitoring common plasma processes
and for communicating via analog and digital outputs with the
application control.
plasma technology for analyzing the plasma, for optimizing the
process, for plasma monitoring, for quality control and for process
controlling. The turn-key EMICON MC systems come with all
features necessary for monitoring common plasma processes
and for communicating via analog and digital outputs with the
application control.
| EMICON MC Features: |
Specifications
Applications
Monitoring and optimizing plasma processes
Analysis of process plasmas
Monitoring of process stability
Endpoint detection in plasma etching
Gas flow control in reactive plasma sputter applications
Detection and monitoring plasma impurities
Quality control in lamp production
Leak detection
Features
Data acquisition with broad band spectrometer
Real-time monitoring of plasma radiation
Process analysis and process monitoring
Replay of saved data for off-line process analysis
Process control with set-point function and PID control
Multi-channel spectrometer systems for spatially resolved
measurements
Hardware and software interface for integration into application
control
User friendly Windows software
Technical Data
Wavelength range: 200 ... 1100 nm
Spectral resolution: 1.5 nm
1-8 spectrometer channels
Time resolution: approx. 20 ms to hours
Analog outputs: ± 10 volts
Digital inputs and outputs: TTL
Applications
Monitoring and optimizing plasma processes
Analysis of process plasmas
Monitoring of process stability
Endpoint detection in plasma etching
Gas flow control in reactive plasma sputter applications
Detection and monitoring plasma impurities
Quality control in lamp production
Leak detection
Features
Data acquisition with broad band spectrometer
Real-time monitoring of plasma radiation
Process analysis and process monitoring
Replay of saved data for off-line process analysis
Process control with set-point function and PID control
Multi-channel spectrometer systems for spatially resolved
measurements
Hardware and software interface for integration into application
control
User friendly Windows software
Technical Data
Wavelength range: 200 ... 1100 nm
Spectral resolution: 1.5 nm
1-8 spectrometer channels
Time resolution: approx. 20 ms to hours
Analog outputs: ± 10 volts
Digital inputs and outputs: TTL
The spectral range of 200-1100 nm of the spectrometer units of
the EMICON MC systems covers the complete UV-VIS-NIR range.
The EMICON MC system can be equipped with up to eight
spectrometer channels with no loss regarding speed of data
acquisition and data transfer. The complete data communication
is managed by a single USB 2.0 line thus enabling the system to
carry out control tasks even with a notebook computer.
The EMICON software provides extensive new features especially
for plasma monitoring, plasma analysis and process control:
recipe manager, arithmetic of spectra, automatic, replay of saved
data, scaling of response curve and much more.
the EMICON MC systems covers the complete UV-VIS-NIR range.
The EMICON MC system can be equipped with up to eight
spectrometer channels with no loss regarding speed of data
acquisition and data transfer. The complete data communication
is managed by a single USB 2.0 line thus enabling the system to
carry out control tasks even with a notebook computer.
The EMICON software provides extensive new features especially
for plasma monitoring, plasma analysis and process control:
recipe manager, arithmetic of spectra, automatic, replay of saved
data, scaling of response curve and much more.
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Applications:
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Accessories:
Optics Components
SpecLine Software
Optics Components
SpecLine Software
| EMICON MC Key Notes: |
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