EMICON HR
The EMICON HR system is a high-resolution spectrometer
system and it is especially qualified for detailed spectral plasma
analysis and plasma monitoring but also for quality control and
process controlling. The single channel EMICON HR system
comes with all features necessary for monitoring and anaylzing
process plasmas in detail.
Specifications
Applications
Spectral analysis of process plasmas
Monitoring and optimizing plasma processes
Monitoring of process stability
Endpoint detection in plasma etching
Detection and monitoring plasma impurities
Features
Data acquisition with broad band spectrometer
Real-time monitoring of plasma radiation
Process analysis and process monitoring
Replay of saved data for off-line process analysis
Process control with set-point function
Hardware and software interface for integration into application
control
User friendly Windows software
Technical Data
Wavelength range: 200 ... 860 nm
Spectral resolution: 0.15 nm
1 spectrometer channels
Time resolution: approx. 20 ms to hours
Analog outputs: ± 10 volts
Digital inputs and outputs: TTL
The spectral range of 200-860 nm of the EMICON HR system
covers the important parts of the UV-VIS-NIR region. Due to the 10
times better spectral resolution of the EMICON HR system
compared to the standard systems neighboring atomic lines or
rotational and vibrational lines of molecular bands can be
resolved easily. The compact design without any moving parts
and the USB 2.0 data transfer makes the EMICON HR system a
very mobile system which can be used easily at many
applications.
The EMICON software provides extensive features especially for
spectral analysis, for plasma analysis and plasma monitoring:
arithmetic of spectra, replay of saved data, recipe manager and
much more.
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EMICON HR High-Resolution
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Number of Channels
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1
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Wavelength range [nm]
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200-860
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Spectral resolution [nm]
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0.15
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Signal resolution
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16 Bit
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Digital in/out
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2/2
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Analog out
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4
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Connectivity
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USB 2.0
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Applications: •Plasma diagnostics, spectral analysis •Film deposition (PVD, PECVD) •Plasma etching, end-point detection •Quality control, fault detection
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