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Applications
The bipolar pulse power supplies model MAGPULS BP are specially designed for all demanding
plasma processes with highest performance . With their wide power range and the complete freely
adjustable pulse frequency these pulse power supplies are best suited for plasma excitation for
creating decorative layers, hard coating layers, manufacturing of flat panels as well as large area
sputter coating, especially dual magnetron sputtering, like architectural glass, films and textile
coatings.
The bipolar pulse power supplies model MAGPULS BP are specially designed for all demanding
plasma processes with highest performance . With their wide power range and the complete freely
adjustable pulse frequency these pulse power supplies are best suited for plasma excitation for
creating decorative layers, hard coating layers, manufacturing of flat panels as well as large area
sputter coating, especially dual magnetron sputtering, like architectural glass, films and textile
coatings.
The bipolar pulsed power supplies model MAGPULS BP are constructed for plasma excitation with
highest performance. The bipolar pulsed power supply is a modular designed system consisting
of the DC power unit and the bipolar pulse unit, which switches the voltage with a freely adjustable
pulse of alternating polarity into the plasma system.
With a power range from 1kW up to 600KW and the adjustable frequency range from DC up to
100kHz, these pulsed power supplies offer highest flexibility for all Sputter applications and most
sophisticated plasma CVD and PVD processes. Unlike many MF generators MAGPULS BP power
supplies don’t need any additional matching networks.
The highly efficient ARC-management can be adjusted optimally for each deposition process to
avoid layer defects effectively in the treated material surface.
All pulse and power parameters can be controlled and indicated via the graphik LCD panel. Of
course all parameters can be controlled via the RS232 interface a well as the optional PROFIBUS
interface due to an external computer system.
Features and Benefits
Frequency - and pulse parameters set free for -> universal use of the most plasma positive und
negative Output polarity processes with one power supply
5 different pulse mode from DC, unipolar pulse -> flexible adjusting for all kind of process up to
bipolar pulse mode request
Voltage control from 10V up to 1000V -> Highest flexibility with Bias coating Processes for
plasma pre-treatment by etching or cleaning
Precise arc detection and shutdown -> avoid droplets and surface defects
Fast DSP-control -> Highest process performance
Frequency - and pulse parameters set free for -> universal use of the most plasma positive und
negative Output polarity processes with one power supply
5 different pulse mode from DC, unipolar pulse -> flexible adjusting for all kind of process up to
bipolar pulse mode request
Voltage control from 10V up to 1000V -> Highest flexibility with Bias coating Processes for
plasma pre-treatment by etching or cleaning
Precise arc detection and shutdown -> avoid droplets and surface defects
Fast DSP-control -> Highest process performance